Investigation of Surface Smoothening
Motivation
Selected results: Schmidt, et al “A new approach to preparing smooth Si(100) Surfaces: Characterization by spectroellipsometry and validation of Si/SiO2 interface properties in MOS devices”, J Vac Sci Jul/Aug 1996
Introduction to Experiment
Conclusions
Future Plans
Email: kwamee@leland.stanford.edu
Other information: NSF ERC Thrust B Presentation, Kwame Eason Stanford