Conclusions

• ESH issues

  • HFPO ? GWP low, but HFA impurity
  • C2H2F4 ? GWP = 1200, but not toxic

• Pulsing can be used to control CFx distribution in films

  • HFPO ? CF2 dominates
  • C2H2F4, CH2F2 ? C-CF dominates
  • CHClF2 ? CF2 ~ 39 % (HFPO ~ 65% max)

• Adhesion “liner” (10/20 HFPO) improves adhesion of less adhesive films

• C2H2F4 gives best deposition rates

• C2H2F4 films more thermally stable than HFPO films

C2H2F4 appears to be most suitable monomer to produce ILD film

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