Table of Contents
Effect of Precursors on the Properties of Pulsed PECVD Fluorocarbon Thin Films
Outline
ILD Materials
Deposition Processes
Pulsed PECVD
Monomer Selection
Film Composition--C1s XPS
Film Composition--FTIR
Objectives
Monomer Selection
Process Characteristics
Process Characteristics
Film Composition--C1s XPS
Film Composition--FTIR
Properties--Dielectric Constant
Process Characteristics
Properties--Surface Morphology
Properties--Adhesion (HFPO)
Properties--Thermal Stability
Gap-Fill Characteristics
Gap-Fill Characteristics
Etch Characteristics
Conclusions
Acknowledgments
|
Author: Catherine Labelle @clabelle@MIT.EDU
|