Table of Contents
Semiconductor Wafer Cleaning/Rinsing Process Monitoring and Control
Diode-laser absorption sensors for real-time control of semiconductor processes
Theory of the diode-laser sensor
Diode-laser measurements of HF absorption (Condition: 94.4 Torr (HF/N2 mixture), 296K, 20 cm path)
Temperature determined from HF absorption in quartz reactor
Summary of the vapor-phase cleaning project
Wafer Rinse Study
Laser-induced fluorescence (LIF) measurements of carryover layer in rinse tank
Absorption spectra of SR 640 in H2SO4/H2O solutions
Progress to date: wafer rinse project
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Author: Shang-I Chou
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