Copper Deposition on Si (100) From De-oxygenated Hydrofluoric Acid
Motivation
Wet Cleaning and Cost of Ownership
Minority Carrier Lifetime Measurement by RF-PCD
High Sensitivity Measurement of Surface States
Band Diagram for Metal Deposition
Lifetime Data for Contaminated Wafers
PPT Slide
Experimental: De-oxygenated HF
Surface Lifetime in De-oxygenated HF
In-Situ Detection of 5 ppb Cu spikes
Possible Mechanisms
Diffusion-Limited Deposition Regimes
Conclusions
Future Work
Email: ajreddy@photonics.mit.edu