Procedure
Quartz boat, 50 bare silicon wafers, SCP 9400 AAT wet bench
Wafers run through either 120 second Super Q (similar to BHF) or 30 second 12:1 HF, overflow rinsed in Dynaflow rinse tank for specified time, overflow rinsed in final rinse tank for 300 seconds while resistivity data is collected, dried in vapor jet dryer
Resistivity data from final rinse converted to mass of chemical carryover into tank, describing the rinse efficiency of the Dynaflow tank