Motivations

6/4/98


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Table of Contents

PPT Slide

Motivations

Silicon in Fluoride Solutions

PPT Slide

FTIR Spectra for H-Si

PPT Slide

Deuterium Labeling to Follow Silicon Etching by FTIR

Step-flow Etching of Si(111)

Dependence of Si(111) Etching

D/H Exchange of Si(100)

Dependence on O2

Dependence on pH

Exchange in BOE

Dependence on HCl

Etching and Oxidation in H2O

Conclusion

Author: Huihong Luo

Email: huisinro@leland.stanford.edu