Table of Contents
Initial Wafer Characterization -Metals, Particles & Microroughness
Outline
Background and Motivation
SSRL TXRF - Background
Basic Operation of TXRF
TXRF Results - Selected Species
Applied Materials, KLA-Tencor: Background
Basic Operation of SP1
CZ P- Particle Data
EPI P/P- Particle Data
Polished EPI P/P- Particle Data
Polished EPI P/P+ Particle Data
Stanford University, Digital Instruments AFM
Basic Operation of AFM
Results of AFM Measurements
Key Issues
Definition of Sequential Wafers
ERC Wetbench, Rinse Water Analysis - TXRF
Next Steps
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Author: Helms Group
Email: kwamee@leland.stanford.edu
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