Development of IFC Chemistry for Use in a Dielectric Etch Application

11/10/98


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Table of Contents

Development of IFC Chemistry for Use in a Dielectric Etch Application

ESH Integration with Technology Development Cycle

Chemistries Examined to Date for Dielectric Etch

HFC/IFC HDP Etch Study (Jun. 1997 - Aug. 1997)

HFC/IFC HDP Etch Study (Jun. 1997 - Aug. 1997)

HFC/IFC HDP Etch Study (Jun. 1997 - Aug. 1997)

HFC/IFC HDP Etch Study (Jun. - Aug. 1997)

IFC HDP Via Etch Process Development (Jun. 1998 +)

IFC HDP Via Etch Process Development (Jun. 1998 +)

IFC HDP Via Etch Process Development (Jun. 1998 +)

IFC HDP Via Etch Process Development (Jun. 1998 +)

IFC HDP Via Etch Process Development (Jun. 1998 +)

IFC HDP Via Etch Process Development (Jun. 1998 +)

IFC HDP Via Etch Process Development (Jun. 1998 +)

IFC HDP Via Etch Process Development (Jun. 1998 +)

HDP TEOS Via Etch Process Development Overview

Near Term Goals

Summary

 Author: Simon Karecki

Email: karecki@mtl.mit.edu