Development of Gas Phase Chemistries to Clean Semiconductor Wafer Surfaces
Cleaning Steps Needed for IC Fabrication
HF/vapor Cleaning Drivers
Water and Energy Use Goals (NTRS, 1997)
Aqueous Phase HF Etching of SiO2
HF/vapor Etching of SiO2: Observations
Time Evolution of Oxide Etching in HF/Vapor
30°C SiO2 Etching Rate Response Surface
SiO2 Etching Rate is Linear in pHF
SiO2 Etching Rate is Parabolic in pHOH
Model SiO2 Etching Mechanism in HF/vapor
SiO2 Model Etching Rate Expression
FTIR Active Surface Chemical Bonds
Vibrational Fingerprints for Adsorbed Species
Surface Kinetics Experiments
Integrated Processing Apparatus
Lab Scale HF/Vapor SiO2 Etching Module
Commercial HF/vapor SiO2 Etching Tool
Acknowledgements
Email: muscat@erc.arizona.edu