Table of Contents
Deposition of Low and Ultra-Low k Dielectrics by ESH Benign CVD Pathways
Objective
ILD Lifecycle and ESH Impact
Chemical Vapor Deposition
Process: Pulsed PECVD
Process: Precursor Gas Selection
Process: Effluent Analysis
Structure: Variation with Duty Cycle I
Structure: Variation with Duty Cycle II
Structure: Variation with Precursor Gas I
Structure: Variation with Precursor Gas II
Structure: Variation with Precursor Gas III
Structure: Comparing NMR and XPS Quantitation I
Structure: Comparing XPS and NMR Quantitation II
Property: Dielectric Constant
Property: Thermal Stability vs Duty Cycle
Property: Thermal Stability vs Precursor Gas
Summary: Pulsed PECVD
Future Work: Motivation
Future Work: Pyrolytic CVD
Future Work: Initial Studies
Acknowledgments
|