Objective

Develop ESH benign processes

for deposition of low and ultra-low k dielectric thin films

Processing

Chemical Vapor Deposition

Solventless

Structure

Fluorocarbon films

CFx quantitation

Network connectivities

Carbon hybridization

Properties

Low k (2 < k < 3)

Ultra-low k (k <= 2)

Thermal stability

Previous slide

Next slide

Back to first slide

View graphic version