Probing the Chemistry of Electronic Materials Processing
CVD and Etching Processes
Surface Analytical Techniques
Experimental Approach
Multiple Internal Reflection Fourier Transform Infrared (MIR-FTIR) Spectroscopy
Process Chamber
Research Areas
Growth Methods for Amorphous Semiconductors
Growth of a-SixC1-x:H Films
Thermal Reactivity of a-SiC:H Films
Hydrogen-Alkane Plasma Etching System
Goals of Project
CH4/H2 Plasma: Growth Conditions
NEXAFS Studies
Schematic Structure of Deposited Film
CH4/H2 Plasma: Sputter / Etch Conditions
Real-Time Mass Spectrometry
Role of Methyl Groups
Semiconductor Surface Reactivity
Organic Synthesis at the Surface
Cycloaddition reactions in organic chemistry
Infrared Spectra
Novel Surface Chemistries
Email: sbent@leland.Stanford.EDU