Hydrogen-Alkane Plasma Etching System
Alkane based plasmas for dry etching ?
less hazardous than halogen-based systems (C2F6, F2, etc.)
smoother surface morphologies
Its efficacy in etching compound semiconductors and metal oxides has been shown (e.g. GaAs, InP, Al2O3)
Can alkane-based plasmas be used to etch Si? SiO2? Si3N4?