Table of Contents
Rinse Processes in Semiconductor Manufacturing: From Fundamentals to Optimization *
Water and Energy Use Goals (NTRS, 1997)
What is an Immersion Wet Bench? (Front-end-of-Line Surface Prep)
PPT Slide
Extreme Rinse Optimization of Post-SPM OFDR
I300I Wet Bench Evaluation, SCP WtS4i
Rinse Optimization Technology Transfer Site Visits 1998
PPT Slide
Post-HF Rinse Experiments in a Production Wet Bench K. Romero, J. Glick and R. Chiarello
Particle Results for Post-HF Rinses J. Glick, AMD
Fluid Mechanics Considerations for Overflow Rinsing in Immersion Wet Benches
Rinse Fundamentals
PPT Slide
PPT Slide
Ongoing Work
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Author: Helms Group
Email: ronc@Stanford.EDU
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