Cu Deposition Mechanism (I)

IEICE Trans. Electron. E79-C, 343 (1996)

Cu2+ + 2e - <-> Cu : +0.337

SiO2 + 4H+ + 4e - <-> Si + 2H2O : -0.857

E0 (V vs. NHE)

Metal deposition on Si surface is determined by the pH of the solution

and redox potentials of the ion and solution.

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