Experimental Parameter
- Cu2+ concentration in solution - May
- Crystal cut (0, 1, 2, 4, 8 degree off)
- Micro-roughness (Si-H, Si-H2, Si-H3)
- pH of solution (DHF, NH4F, DHF+NH4F)
At first, Cu deposition on ideal H-Si(111) surface will be investigated
as functions of the following parameters.