Solvent Replacement: Lithography
N. Sundararajan, S. Yang, J. Wang, K. Ogino, S. Valiyaveettil, C. K. Ober, S. K. Obendorf and R. D. Allen, “Resists Processed in Supercritical CO2”, Chem. Mater., accepted.
- Block copolymer resist and supercritical development at Cornell
- 193 nm ArF excimer exposure performed at IBM Almaden
- Long image stability (~1 week)