PPT Slide

Misra et al. -- Experimental Details

• Wafer on spin-dry station

• Hydrophilic surface:

HF/HCl/H2O2(oxide etch) -> S/D -> SC2 oxide -> S/R/D

• Hydrophobic surface:

HF/HCl/H2O2(oxide etch) -> S/D

• All-teflon static contamination bath: pH=~5.6

• Ca (0.02ppb- 10ppb) in DI water

• Surface Ca analysis: VPD-DC-AAS

AFM for surface morphology

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