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Lowenstein et al: Experimental Details

• Hydrophilic surface:

IMEC clean (H2SO4/O3-> DHF -> HCl/O3 rinse ->Marangoni dry

• Wafer on spinning station:

pipette solution on wafer (static) -> spin-removal of solution

• Extensive list of metals studied in solution:

Al3+, Ba2+, Ca2+, Cr3+, Cu2+, Fe3+, K+, Ni2+, Sr2+, Zn2+

• Surface metal analysis:

VPD-DC-TXRF (except for Al -> AAS)

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