Berkeley Modeling Program
Current Status:
- Hybrid fluid-kinetic model with CF4 chemistry developed
- Experimental comparison to 2D axisymmetric plasma model
- Lam TCP 9000 series modeled with Argon plasma
Future Work:
- Model Lam TCP 9000 series with PFC chemistry for oxide etch
- Iterative plasma and surface chemistry model improvement via critical comparison to experiment
- Couple plasma tool model to downstream process model, including POU abatement device