MODELING PFC PLASMA CHEMICAL KINETICS Sergej Mahnovski and David Graves, UC Berkeley
Focus: Kinetics of POU abatement and oxide etch.
Currently:
- Investigating CF4 creation and loss kinetics in CF4/O2 and C2F6/O2 plasmas.
- Performing sensitivity analysis to reaction mechanism with respect to uncertainties in rate constants.
- Preliminary results suggest that pressure plays an important role in favoring certain reaction pathways.
Future:
- Utilize computational chemistry techniques to explore accuracy and completeness of rate coefficients and reaction mechanism.
- Evaluate importance of surface reactions and their competition with gas phase kinetics.
- Explore effects of H and other etch products on downstream chemistry.