Motivation
Measurements of carryover layer diffusion allows optimization of rinse strategies (tank geometry, flow rate, …)
Issues to consider: radial diffusion, boundary diffusion, convection, physical/chemical adsorption, acid/base dissociation,...
- Monitor carryover layer diffusion for theoretical modeling and fundamental understanding of wafer rinsing processes.
- Reduce UPW usage by improving wafer rinse processes in the semiconductor manufacturing.