Aqueous Phase HF Etching of SiO2

• Steric Hindrance

• Functional groups attached to -OH

• pH

• Solubility of solvent in water

• Amount of SiO2 Etched (Å) vs. t
  • 3.3:1:1 = Solvent : HOH : HF
    • Solvents
      • HOH, acids, alcohols
    • 19°C

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