Expanding Our Study
Now that we have developed a base process to study adsorption
and desorption, we need to start looking at different variables which
will make our system more representative of the Cu CMP system.
There are 2 main areas for exploration:
- Different Surfaces - low k dielectrics, barrier layers, Cu
- Different Chemistries - Cu complexes, additives, organics, HF
It is important to see how these changes in the system will affect
the adsorption and desorption processes.