Questions
We are already set up to perform fundamental adsorption and
desorption studies. We can easily incorporate the CMP chemistries
into our system,but we first need to understand more about the
- What are the additives being used in Cu CMP?
- What are the concentrations of these additives?
- What forms of Cu are predominant - metallic or ionic?
- What is the initial Cu level?
- Are there opportunities to do work in a fab using actual
- Can we get TXRF data on our wafers?