Property: Thermal Stability vs Precursor Gas
19F NMR Spectra
of Pulsed PECVD
Films
10/400
HFPO
10/100
HFC134
10/100
HFC32
difference spectra
between as-dep and annealed films
annealing at 200 oC in N2 for 1 h
films from HFC precursors
lose terminations and
adsorbed monomer
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