PPT Slide
RECENT INTERCONNECT CONFERENCE SUMMARY
Advanced Semiconductor Manufacturing Conference, Sept 99 in Boston, MA
- Documentation by Dataquest specifically revising their prediction 2 years ago of first generation kɛ.0 materials being SOD to CVD C-Doped Oxide materials.
Advanced Metallization Conference, Sept 99 in Orlando, FL
- First generation low k material will be FSG.
- Conference papers shows promising result of CVD Low k, Carbon Doped Oxide.
- Key consensus from Panel Discussion: - CVD Low k provides better reliability than SOD. - Toughness, mechanical strength and adhesion of Low k are keys to success
ɘ.15mm Interconnect Materials Workshop, Nov 99 in Monterey, CA
- Oxide type of Low k materials is the most promising.
- Thermal-mechanical properties are the most crucial criteria for selection.