SRC/SEMATECH Engineering Research Center for Environmentally Benign Semiconductor Manufacturing

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News in Brief

2009 Simon Karecki Award Presented to Nandini Venkataraman

Anna and Richard Karecki presented the 2009 Simon Karecki Award to Nandini Venkataraman  at the ERC Review Meeting in Tucson Arizona

The 2009 Simon Karecki Award was presented to Nandini Venkataraman, a student at the University of Arizona, at the annual research review of the SRC/SEMATECH Engineering Research Center for Environmentally Benign Semiconductor Manufacturing (ERC) on February 18, 2009. Marsaharu Kobayashi, Stanford University, was also recognized as a finalist.

This is the eighth presentation of the Simon Karecki Award. This award is given in memory of Dr. Simon Karecki who was a student in this Center and an SRC Fellow. Friends and colleagues of Simon have come together to create the Simon Karecki Fellowship Fund in memory of an outstanding young man and researcher, and as a way to encourage other talented young researchers in the pursuit of environmental research.

Nandini is pursuing her PhD in Materials Science and Engineering at the University of Arizona under the direction of Professor Srini Raghavan. Her thesis project focuses on back end of line cleaning and involves the development of environmentally benign chemical systems using the principles of Electrochemical Impedance Spectroscopy. She is also attempting to develop a cleaning "end point" method, which would contribute to the reduction of chemical use. Nandini has presented her research at the Materials Research Society Spring Conference and at SRC's TECHCON 2008, and she has authored or co-authored twelve papers and conference presentations. She has a great understanding of fundamentals and appreciation of ESH aspects and is most willing to work with others in her research groups and to mentor undergraduates.

One of the criteria for receiving the Simon Karecki Award is academic excellence. Nandini has maintained a perfect 4.0 throughout her graduate work. She has held an Applied Materials Graduate Fellowship for the last two years, and before that, held a Louis Demer Academic Scholarship awarded by the University of Arizona.  Nandini held an internship at Intel during the summer of 2008 investigating the electrochemical migration issues in lead free solder pastes used in packaging. Intel was sufficiently impressed with her work that they offered her a job and so she will be joining Intel in Chandler, AZ when she completes her degree later this year.  Nandini's talent for research, leadership skills and strong interest in environmental issues make her an ideal recipient of the Simon Karecki Award.

 

Best Paper Award

BEST STUDENT PAPER AWARD was presented to Kedar Dhane, University of Arizona, at the SEMATECH Surface Preparation and Cleaning Conference (SPPC), March 2009 in Austin TX.  The SPCC is an annual event which brings together prominent researchers from the semiconductor industry and the university community to focus on the current developments and ITRS challenges in advanced water and mask cleaning and surface preparation technologies for the 32nm node and beyond.

Paper:  "Novel Metrology for Application in Wet Surface Preparation of Patterned Wafers"; Dhane, K., Han, J. Yan, J., Zhang, X., Vermeire, B., Shadman, F. 

Semiconductor International Article

David Lammers, News Editor -- Semiconductor International, 3/25/2009 6:26:00 AM

Rinse/Dry Steps Get New Look at SPCC

The Sematech Surface Preparation and Cleaning Conference (SPCC) opened with several presentations on how to reduce water, chemical and energy usage during cleaning steps. A study conducted at the University of Arizona, with participation from Samsung Electronics Co., employed on-wafer sensors to monitor residual impurity concentrations during hot rinse and spin dry steps.

Rinsing and drying techniques are getting more attention as semiconductor companies seek to become more environmentally benign, speakers said at the Sematech Surface Preparation and Cleaning Conference (SPCC, Austin, Texas). Challenges — ranging from cleaning high-aspect-ratio devices to rinsing and drying layers with hydrophobic low-k dielectrics — are driving companies to new approaches, often using single-wafer cleaning tools with shorter process times.

Jeongnam Han, Samsung Electronics
Jeongnam Han, Samsung Electronics

Jeongnam Han, a member of the process R&D staff, said Samsung Electronics Co. (Seoul, South Korea) is using an Electro-Chemical Residue Sensor (ECRS) developed by Environmental Metrology Corp. (EMC, Tucson, Ariz.) a spinoff from the University of Arizona.

Dhane Kedar, University of Arizona
Dhane Kedar, University of Arizona

Founded in 2003 by Arizona professor Farhang Shadman, Bert Vermeire and others, the company has signed up several chip companies to employ the ECRS for in situ monitoring of impurities on wafers. Multiple ECRSs, built from silicon and poly, are used to monitor the residual impurity concentrations on a wafer during rinsing and spin drying steps, said Kedar Dhane, a graduate research assistant at the University of Arizona. Several companies, including Samsung and Freescale Semiconductor Inc.’s Tempe, Ariz. facility, are working with EMC, Dhane said.

For the complete article:  http://www.semiconductor.net/article/CA6646483.html

 

 

The SRC and the SRC/SEMATECH Engineering Research Center 
for Environmentally Benign Semiconductor Manufacturing
SIMON KARECKI FELLOWSHIP FUND


Karecki Award Presentation.  From left, Dr. Muacat, Mr. Karecki, Casey Finstad, Mrs. Karecki, and Dr. Shadman


Karecki Award Presentation.  From the left, Dr. Reif, Mrs Karecki, Nikhil Krishnan, Mr. Karecki, and Dr. Aitchison


Karecki Award Presentation. From left, Mrs. Karecki, Hyoungsub Kim, April Ross and Mr. Karecki.


Karecki Award Presentation.  Yasa Sampurno and Mrs. Anna Karecki


Karecki Award Presentation.  From left, Mrs. Anna Karecki, Nandini Venkataraman, Mr. Richad Karecki

The Simon Karecki Award Fund was created by the Semiconductor Research Corporation (SRC) and the SRC/SEMATECH Engineering Research Center for Environmentally Benign Semiconductor Manufacturing (ERC) in memory of Simon Karecki to recognize his outstanding contributions to the research performed as a SRC Graduate Fellow at the ERC, and to encourage other talented young researchers in the pursuit of environmental research.  

 

Selection criteria include:  academic excellence; demonstrated concern for the earth's environment; demonstrated ability for technical communication; and demonstrated ability to work with others and foster cooperation.

 

RECIPIENTS:
 

2002 Simon Karecki Award Recipient:
Casey Finstad, University of Arizona

 

2003 Simon Karecki Award Recipient:
Nikhil Krishnan, University of California-Berkeley

2004 Simon Karecki Award Recipients:
Hyoungsub Kim, Stanford University
April Ross, MIT

2005 Simon Karecki Award Recipient:
Subramanian Tamilmani, University of Arizona
 

2006 Simon Karecki Award Recipient:
Rong Chen, Stanford University
Finalist recognition
Jun Yan, University of Arizona and Felix Nelson, Cornell University
 

2007 Simon Karecki Award Recipient: 
Nelson Felix, Cornell University
Finalist recognition: 
Ashok Muthukumaran and Yasa Adi Sampurno, University of Arizona

 

2008 Simon Karecki Award Recipient:
Yasa Adi Sampurno, University of Arizona
 

2009 Simon Karecki Award Recipient:
Nandini Venkataraman, University of Arizona

Finalist recognition
Marsaharu Kobayashi, Stanford University
 


For more information about the Fund, contact:  Karen McClure (kmcclure@erc.arizona.edu)