| -
1998 - |
| Sept.3 |
Thrust C: Applications of TXRF in Semiconductor
Manufacturing
Ronald Chiarello, Stanford University (.ppt
presentation) |
| Sept. 10 |
All Center: Water Recycle and Waste Treatment in HP's CMP
Russ Parker, Hewlett Packard (ppt.presentation) |
| Sept. 17 |
Thrust A: Stanford Abatement and Test Structure Work for PFC Reduction
Presentation Set A and Presentation Set B
Jim McVittie, Stanford University (presentation
.ppt 1) (presentation
.ppt 2) |
| Sept. 24 |
Thrust B: Using Quantum Chemistry for Predicting Semiconductor Surface
Chemistry
Charles Musgrave, Stanford University (.ppt
presentation) |
| Oct. 1 |
Thrust C: Modified Photoresist Application to
Reduce Waste and VOC Emission Post CMP Cleaning
Steve Beaudoin, Arizona State University (presentation) |
| Oct. 2 |
AMD Teleconference: Treatment of CMP Waste Streams
James Baygents and Srini Raghavan, University of Arizona (.ppt
presentation)
Low Water Rinsing of Ionic Contaminants After Copper CMP
Heather Dunlop, University of Arizona (.ppt
presentation)
CMP Sensor for Reduced Consumption
Duane Boning, MIT |
| Oct. 8 |
All Center: Using Supercritical CO2 as a Lithographic Developer
Chris Ober, Cornell University (.ppt
presentation) |
| Oct. 15 |
Thrust A: Deposition of Low & Ultra Low-k Dielectrics by ESH Benign CVD
Pathways
Kenneth Lau, MIT (html
presentation) |
| Oct. 22 |
Thrust B: Probing the Chemistry of Electronic Materials Processing
Stacey Bent, Stanford University (html
presentation) |
| Oct. 29 |
Thrust C: Rinse Processes in Semiconductor Manufacturing: From Fundamentals
to Optimization
Ronald Chiarello, Stanford University (.ppt
presentation) |
| Nov. 5 |
All Center: Water Contamination Issues
Associated with CMP Rinse Operation
Michael Tritapoe and Bill Madden, AMD (html
presentation) |
| Nov. 12 |
Thrust A: Development of IFC Chemistries for
use in a Dielectric Etch Application
Simon Karecki, MIT (html
presentation)
|
| Nov. 19 |
Thrust B: Development of Gas Phase Chemistries
to Clean Semiconductor Water Surfaces
Anthony Muscat, University of Arizona (html
presentation) |
| Dec. 3 |
Thrust C: The Influence of Tank Volume on the
Effectiveness of Overflow Rinse Processes
Andy Hebda, Graduate Student, University of Arizona (html
presentation)
Thrust C: In-Situ Conductivity Device for Deep Trench Rinse Research
Daniel Seif, Graduate Student, University of Arizona (html
presentation) |
